Micro/Nano Manufacturing Technolog
Focused ion beam-1: Principle
2025.4.14
,Outline 2
1. Principle
2. FIB imaging
3. FIB sputtering
Bitmap Patterning
Astigmatism Correction
Beam Overlap
Dwell Time
Scan Orientation
Channeling Effect
4. Application
,1. Principle 2
Energy of the ions: several to dozens of keV
Beam size: nanometric to sub-nano scale Why can such a small beam size be realize
, 2
◼ Displacement of atoms and ion deposition in th
◼ Electron emission (an effect realizing imaging)
◼ Sputtering of neutral and ionized substrate ato
◼ Chemical interactions of breaking chemical bonds